Flat electro-optical frequency combs play an important role in a wide range of applications, such as metrology, spectroscopy, or microwave photonics. As a key technology for the integration of optical circuits, silicon photonics could benefit from on-chip, tunable, flat frequency comb generators. In this article, two different architectures based on silicon modulators are studied for this purpose. They rely on a time to frequency conversion principle to shape the comb envelope. Using a numerical model of the silicon traveling-wave phase modulators, their driving schemes are optimized before their performances are simulated and compared. A total of nine lines could be obtained within a 2 dB flatness, with a line-spacing ranging from 0.1 to 7 GHz. Since this tunability is a major asset of electro-optical frequency combs, the effect of segmenting the phase modulators is finally investigated, showing that the flat lines spacing could be extended up to 39 GHz by this method.

We report supercontinuum generation in nitrogen-rich (N-rich) silicon nitride waveguides fabricated through back-end complementary-metal-oxide-semiconductor (CMOS)-compatible processes on a 300 mm platform. By pumping in the anomalous dispersion regime at a wavelength of 1200 nm, two-octave spanning spectra covering the visible and near-infrared ranges, including the O band, were obtained. Numerical calculations showed that the nonlinear index of N-rich silicon nitride is within the same order of magnitude as that of stoichiometric silicon nitride, despite the lower silicon content. N-rich silicon nitride then appears to be a promising candidate for nonlinear devices compatible with back-end CMOS processes.

Near-infrared germanium (Ge) photodetectors monolithically integrated on top of silicon-on-insulator substrates are universally regarded as key enablers towards chip-scale nanophotonics, with applications ranging from sensing and health monitoring to object recognition and optical communications. In this work, we report on the high-data-rate performance pin waveguide photodetectors made of a lateral hetero-structured silicon-Ge-silicon (Si-Ge-Si) junction operating under low reverse bias at 1.55 μm. The pin photodetector integration scheme considerably eases device manufacturing and is fully compatible with complementary metal-oxide-semiconductor technology. In particular, the hetero-structured Si-Ge-Si photodetectors show efficiency-bandwidth products of ～9 GHz at ?1 V and ～30 GHz at ?3 V, with a leakage dark current as low as ～150 nA, allowing superior signal detection of high-speed data traffic. A bit-error rate of 10?9 is achieved for conventional 10 Gbps, 20 Gbps, and 25 Gbps data rates, yielding optical power sensitivities of ?13.85 dBm, ?12.70 dBm, and ?11.25 dBm, respectively. This demonstration opens up new horizons towards cost-effective Ge pin waveguide photodetectors that combine fast device operation at low voltages with standard semiconductor fabrication processes, as desired for reliable on-chip architectures in next-generation nanophotonics integrated circuits.